Kiyoko's Notes
A deep cleansing hair line focused on excess sebum.
OFF & RELAX Deep Cleanse line is designed to combat excess sebum, ensuring a healthier scalp and hair. With a blend of domestic hot spring waters from Izumo, Yubara, and the Alps, this gentle cleansing formula pampers your scalp. The double zinc colloid formula effectively manages sebum secretion, eliminating the risk of odor and itchiness. Packed with natural ingredients like plankton extract, piroctone olamine, sake lees extract, tea leaf extract, and eucalyptus leaf oil, it not only improves the scalp environment but also enhances its texture while maintaining a balanced sebum level.
| Features | Forest scent Cleanses gently with hot spring water from Izumo, Yubara, and the Alps. Controls excess sebum, preventing odor and itchiness. Enriched with botanical extracts for improved scalp texture and sebum balance. Maintain sebum balance and improve skin texture. |
| Hair Concern | Oily Hair/Scalp Itchy scalp |
| Hair Type | Recommended for all hair types |
| Made In | JAPAN 🇯🇵 |
How to use
After shampooing, lightly drain the water, take an appropriate amount and apply it from the ends of the hair to the entire hair. It is more effective if you wash it off after a few minutes.
Ingredients
| Ingredient highlights | Sulfate-Free Paraben-Free |
Full list of ingredients
Water, Stearyl Alcohol, Cetanol, Stearoxypropyltrimonium Chloride, Amodimethicone, Hydrolyzed Cornstarch, Hot Spring Water, Saccharomyces/Zinc Culture, Dilauroylglutamate Lysine Sodium, Sake Lees Extract, Tea Leaf Extract, Maghua Root Bark Extract, Corn Syrup, Saxifrage Extract, Tetraselmis Suecica Extract, Saccharomyces/Copper Culture, Saccharomyces/Magnesium Culture, Saccharomyces/Iron Culture, Saccharomyces/Silicon Culture, Leuconostoc/Radish Root Fermentation Liquid, PCA Zinc, Behenamidopropyl Dimethylamine, Hydroxyethyl Cellulose, Glycerin, Benzyl Alcohol, PPG-34, Mannitol, Lactic Acid, Potassium Sorbate, Sodium Benzoate, Phenoxyethanol, Disodium EDTA, Butylene Glycol (BG), Fragrance.